Occupations · Architecture and Engineering
Microsystems Engineers
Research, design, develop, or test microelectromechanical systems (MEMS) devices.
O*NET 30.3 Database (USDOL/ETA) · occupation code 17-2199.06
What people in this job actually do
Ordered by how important the work is rated.
- Create schematics and physical layouts of integrated microelectromechanical systems (MEMS) components or packaged assemblies consistent with process, functional, or package constraints.
- Evaluate materials, fabrication methods, joining methods, surface treatments, or packaging to ensure acceptable processing, performance, cost, sustainability, or availability.
- Refine final microelectromechanical systems (MEMS) design to optimize design for target dimensions, physical tolerances, or processing constraints.
- Investigate characteristics such as cost, performance, or process capability of potential microelectromechanical systems (MEMS) device designs, using simulation or modeling software.
- Conduct harsh environmental testing, accelerated aging, device characterization, or field trials to validate devices, using inspection tools, testing protocols, peripheral instrumentation, or modeling and simulation software.
- Develop or file intellectual property and patent disclosure or application documents related to microelectromechanical systems (MEMS) devices, products, or systems.
- Conduct or oversee the conduct of prototype development or microfabrication activities to ensure compliance to specifications and promote effective production processes.
- Create or maintain formal engineering documents, such as schematics, bills of materials, components or materials specifications, or packaging requirements.
- Conduct experimental or virtual studies to investigate characteristics and processing principles of potential microelectromechanical systems (MEMS) technology.
- Conduct analyses addressing issues such as failure, reliability, or yield improvement.
- Devise microelectromechanical systems (MEMS) production methods, such as integrated circuit fabrication, lithographic electroform modeling, or micromachining.
- Develop or validate specialized materials characterization procedures, such as thermal withstand, fatigue, notch sensitivity, abrasion, or hardness tests.
O*NET 30.3 task ratings, importance scale
Skills that matter most
Importance, rated 1 to 5.
O*NET 30.3 skills, importance scale
Software and tools
A dot marks what O*NET flags as in demand.
O*NET 30.3 software skills · hot-technology flag
What this work is actually like
Conditions rated against the average across all occupations — only what makes this job different is listed.
O*NET 30.3 Job Zones
Working conditions that stand out
O*NET 30.3 work context, frequency scale · observed 2016-07
How people actually get in
Share of workers by the education they hold.
O*NET 30.2 education, training and experience · observed 2016-07
What kind of person the work suits
Occupational interest profile, rated 1 to 7.
O*NET 30.2 occupational interests (RIASEC)
What you take with you
Skills rated for how well they transfer into other occupations.
O*NET 30.3 transferable skills, importance scale
Knowledge the work draws on
Abilities it leans on
O*NET 30.3 abilities and knowledge, importance scale
How this job is advertised
The same work is posted under many titles — this is what to search for.
O*NET 30.3 job titles reported for this occupation
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What changed since 2015
Comparing O*NET release 20.1 (2015-10-01) with 30.3 (2026-05-01). Signs, not colour alone, carry the meaning. 3 entries that were only relabelled between releases are left out.
Now listed 30
No longer listed 9
Diff across the O*NET releases held here in full since October 2015, following occupations through merges and retirements. O*NET re-surveys occupations on a rolling cycle, so “no change” can also mean “not re-surveyed”.
Related jobs
O*NET 30.3 related occupations
Also called
O*NET 30.3 alternative titles
The same work in Europe
| ESCO occupation | ISCO | Match |
|---|---|---|
| microsystem engineer | 2152.1.7 | exact |
Official ESCO ↔ O*NET crosswalk (ESCO Secretariat with USDOL/ETA)
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